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OPMS-1650F magnetron sputtering coating machine Vacuum chamber size :φ1650mm*H1280mm Vacuum system: molecular pump + bipolar rotary vane pump Target system: Moment target/Round target/column target Sputtering source :MF power supply /ICP power supply (13.56MHZ) No-load limit vacuum :8.0x10-⁵Pa No-load recovery vacuum :2x10-3Pa≤10min Our equipment can be customized according to the process requirem

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